Abstract/Details

Noise in gallium nitride-based quantum well structures used for nanometer devices in the frequency range 1 Hz–3 Mhz and temperature range 77K–324K


2002 2002

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Abstract (summary)

Electronic noise has been investigated in AlxGa1−x N/GaN Modulation-Doped Field Effect Transistors (MODFETs) of submicron dimensions, grown for us by MBE (Molecular Beam Epitaxy) techniques at Virginia Commonwealth University by Dr. H. Morkoç and coworkers. Some 20 devices were grown on a GaN substrate, four of which have leads bonded to source (S), drain (D), and gate (G) pads, respectively. Conduction takes place in the quasi-2D layer of the junction (xy plane) which is perpendicular to the quantum well (z-direction) of average triangular width ∼3 nm. A non-doped intrinsic buffer layer of ∼5 nm separates the Si-doped donors in the AlxGa1−xN layer from the 2D-transistor plane, which affords a very high electron mobility, thus enabling high-speed devices. Since all contacts (S, D, and G) must reach through the AlxGa1−xN layer to connect internally to the 2D plane, parallel conduction through this layer is a feature of all modulation-doped devices. While the shunting effect may account for no more than a few percent of the current IDS, it is responsible for most excess noise, over and above thermal noise of the device.

The excess noise has been analyzed as a sum of Lorentzian spectra and 1/f noise. The Lorentzian noise has been ascribed to trapping of the carriers in the AlxGa1−xN layer. A detailed, multitrapping generation-recombination noise theory is presented, which shows that an exponential relationship exists for the time constants obtained from the spectral components as a function of 1/kT. The trap depths have been obtained from Arrhenius plots of log (τT2) vs. 1000/T. Comparison with previous noise results for GaAs devices shows that: (a) many more trapping levels are present in these nitride-based devices; (b) the traps are deeper (farther below the conduction band) than for GaAs. Furthermore, the magnitude of the noise is strongly dependent on the level of depletion of the AlxGa1−xN donor layer, which can be altered by a negative or positive gate bias VGS.

Altogether, these frontier nitride-based devices are promising for bluish light optoelectronic devices and lasers; however, the noise, though well understood, indicates that the purity of the constituent layers should be greatly improved for future technological applications.

Indexing (details)


Subject
Electrical engineering;
Materials science
Classification
0544: Electrical engineering
0794: Materials science
Identifier / keyword
Applied sciences; Gallium nitride-based; Nanometer devices; Noise; Quantum well
Title
Noise in gallium nitride-based quantum well structures used for nanometer devices in the frequency range 1 Hz–3 Mhz and temperature range 77K–324K
Author
Duran, Rolando Silvano
Number of pages
139
Publication year
2002
Degree date
2002
School code
1023
Source
DAI-B 63/04, Dissertation Abstracts International
Place of publication
Ann Arbor
Country of publication
United States
ISBN
0493642102, 9780493642109
Advisor
Vliet, Carolyne M. Van
University/institution
Florida International University
University location
United States -- Florida
Degree
Ph.D.
Source type
Dissertations & Theses
Language
English
Document type
Dissertation/Thesis
Dissertation/thesis number
3049800
ProQuest document ID
305435834
Copyright
Database copyright ProQuest LLC; ProQuest does not claim copyright in the individual underlying works.
Document URL
http://search.proquest.com/docview/305435834
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